E16300 - SEMI E163 - Guide for the Handling of Reticles and Other Extremely Electrostatic Sensitive (EES) Items Within Specially Designated Areas Revision:SEMI E163-0212 (Reapproved 1217) - Inactive previously published October 2011

previously published October 2011

and 150 mm Plastic and Metal Wafer Carriers

These terms apply to photomasks that are principally used in fabricating flat panel display

SEMI E30-95 (technical revision)

E16300 - SEMI E163 - Guide for the Handling of Reticles and Other Extremely Electrostatic Sensitive (EES) Items Within Specially Designated Areas Revision:SEMI E163-0212 (Reapproved 1217) - Inactive previously published October 2011The purpose of this Document is to minimize the negative impact on productivity caused by static charge and electric fields in semiconductor manufacturing equipment and facilities. It is a Guide for establishing optimum electrostatic compatibility of the handling environment for reticles and other items that are extremely electrostatic sensitive (EES) to electrostatic charge, voltage, and electric field. This Guide is complementary to SEMI E78 and