SEMI F63 — Guide for Ultrapure Water Used in Semiconductor Processing
7 For reference purposes
SEMI M58 — Test Method for Evaluating DMA Based Particle Deposition Systems and Processes
本スタンダードは，Global Micropatterning Committeeで技術的に承認されたもので，North American Microlithography Committeeが直接責任を負うものである。現版は2004年8月16日North American Regional Standards Committeeにて承認されている。2004年9月にまずwww
P01200 - SEMI P12 - Determination of Iron, Zinc, Calcium, Magnesium, Copper, Boron, Aluminum, Chromium, Manganese, and Nickel in Positive Photoresists by Inductively Coupled Plasma Emission Spectroscopy (ICP) Revision:SEMI P12-0997 - Inactive SEMI F63 — Guide forNOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use. This procedure is an ICP plasma emission analysis for determination of iron, zinc, calcium, magnesium, copper, boron, aluminum, chromium, manganese, and nickel in photoresist. The applicable concentration range is 0. 1 to 1
