MF067300 - SEMI MF673 - Test Method for Measuring Resistivity of Semiconductor Wafers or Sheet Resistance of Semiconductor Films with a Noncontact Eddy-Current Gauge Revision:SEMI MF673-0317 - Superseded 1 This Specification defines six

1  This Specification defines six mutually exclusive

This Standard specifies selected geometrical requirements of glass substrates used to manufacture flat panel displays

SEMI MF847 — Test Method for Measuring Crystalographic Orientation of Flats on Single Crystal Silicon Wafers by X-Ray Techniques

1 — Mechanical Specification for FOUPs Used to Transport and Store 300 mm Wafers

MF067300 - SEMI MF673 - Test Method for Measuring Resistivity of Semiconductor Wafers or Sheet Resistance of Semiconductor Films with a Noncontact Eddy-Current Gauge Revision:SEMI MF673-0317 - Superseded 1 This Specification defines sixResistivity is a primary quantity for characterization and specification of material used for semiconductor electronic devices. Sheet resistance is a primary quantity for characterization, specification, and monitoring of thin film fabrication processes. This Test Method outlines the principles of eddy current measurements as they relate to semiconductor substrates and certain thin films fabricated on such substrates as well as requirements for